Equipment
- Dedicated high performance computing facility for large scale FDTD calculations
- Automatic nanometer positioning system for fiber to chip coupling
- High resolution optical spectrum analyzers
- High performance tunable laser sources with 1260 nm – 1640 nm wavelength range
- Optical monochromator (1/4m)
- Q-switched Nd:YAG laser and THG pumped OPO (355 nm – 2.5 µm)
- Optical slab waveguide attenuation measurement station
- Waveguide far- and near-field analysis
- ATR spectrometer (refractive index and thickness measurement of thin films)
- Surface plasmon spectrometer
- High electric field poling setup (corona and contact) with in-situ second-harmonic-generation monitoring
- Teng-Man measurement setup (Pockels effect)
- Maker – Fringe – measurement setup
- Luminescence measurement station
- Clean room (class 100)
- DI-water
- Spin-Coater
- Vacuum drying ovens
- Mask aligner
- Electron beam evaporator (chrome, gold, silver, aluminum)
- Thermal evaporator (gold)
- RF and DC sputtering
- Surface profilometer (Dektak)
- UV-VIS-NIR absorption spectrometer
- PECVD
- Atomic force microscope
- Microwave measurement station in the X- and Ka-Band, at low temperatures and high magnetic fields
- Apparatus for measurement of magnetotransportproperties in the temperature range 1.6K < T < 400K
- Broadand dielectric measurement system
- InGaAs – NIR camera
- High resolution B/W camera system